Work

Formation of multiple Double Layers in the presence of grounded ring in RF expanding plasma

Year: 2023

Type: article

Source: Physics Letters A

DOI: 10.1016/j.physleta.2023.129016

Authors: P.K. Saha, M. Chakraborty, D. Dutta, N. Sharma, A. Mukherjee

Institution: Centre of Plasma Physics - Institute for Plasma Research

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Department of Atomic Energy, Government of India, Institute for Plasma Research

OpenAlex ID: W4384207648

FWCI: 0.071

Cites: 36

Cited by: 1

Related to: 10