Work

Inorganic capping layers in advanced photosensitive polymer based RDL processes: processing and reliability

Year: 2023

Type: conference-paper

Source: IEEE Electronic Components and Technology Conference (ECTC)

DOI: 10.1109/ectc51909.2023.00350

Authors: Nelson Pinho, Emmanuel Chery, Ritwik Bhatia, Ganesh Sundaram, John Slabbekoorn, Mikhail Krishtab, Andy Miller, Eric Beyne

Institutions: IMEC, Veeco (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4385541876

FWCI: 2.241

Cites: 14

Cited by: 5

Related to: 10