Enhancement of infrared emissivity of silicon nitride thin films by inducing metallic phases via titanium thermal diffusion
Year: 2023
Type: conference-paper
Abstract: Transition metal nitrides are drawing attention due to their promising mechanical, electrical and chemical properties which are frequently leveraged for industrial and scientific applications such as wear-resistant tool coatings, decorative coatings, thin film resistors, semiconductor gate dielectrics, energy conversion and storage.Among them, Titanium Silicon Nitride (TiSiN) is used extensively due to its excellent hardness, wear and corrosion resistance, and electrical properties.It comprises of metallic and dielectric phases coexisting.From the literature, the infrared mechanism is different for metals (free carrier absorption) and dielectrics (phonon absorption) (1).There are limited reports on the thermal properties of ternary alloys especially their infrared mechanism.Thermal studies become significant when the temperature of such films rises due to friction, light absorption etc.
DOI: 10.1615/rad-23.390
Language: English
Subfield: Civil and Structural Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W4385761963