Work

Comparative Study on Indium Precursors for Plasma-Enhanced Atomic Layer Deposition of In2O3 and Application to High-Performance Field-Effect Transistors

Year: 2023

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.3c11796

Authors: Ho Young Lee, Jae Seok Hur, Iaan Cho, Cheol Hee Choi, Seong Hun Yoon, Yongwoo Kwon, Bonggeun Shong, Jae Kyeong Jeong

Institutions: Hanyang University, Hongik University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Hongik University, Korea Institute for Advancement of Technology, National Research Foundation of Korea, Samsung, Institute for Information and Communications Technology Promotion

Awards: G2056480057, G2983246645, G322505163, G3739253089, G5442972664

OpenAlex ID: W4387930724

FWCI: 3.136

Cites: 51

Cited by: 44

Related to: 10