Work

Machine learning-based exploration of molecular design descriptors for area-selective atomic layer deposition (AS-ALD) precursors

Year: 2023

Type: article

Source: Journal of Molecular Modeling

DOI: 10.1007/s00894-023-05806-y

Authors: Tran Thi Ngoc Van, Changsu Kim, Hojae Lee, Jiyong Kim, Bonggeun Shong

Institutions: Hongik University, Sungkyunkwan University

Language: English

Topic: Machine Learning in Materials Science

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: National Research Foundation of Korea

Awards: G2056480057, G4014154334

OpenAlex ID: W4389767415

FWCI: 0.872

Cites: 41

Cited by: 13

Related to: 10