Work

(Invited) The Use of Plasmas for Isotropic Atomic Layer Etching

Year: 2023

Type: conference-abstract

Source: ECS Meeting Abstracts

DOI: 10.1149/ma2023-02291464mtgabs

Authors: Nicholas John Chittock, Wilhelmus M. M. (Erwin) Kessels, Harm Knoops, Adrie Mackus

Institution: Eindhoven University of Technology

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4391662914

Cites:

Cited by: 1

Related to: 10