Work

Unraveling the Slurry/Substrate Interfacial Reaction Mechanism for Wide Band Gap (WBG) Chemical Mechanical Planarization (CMP)

Year: 2023

Type: conference-abstract

Source: ECS Meeting Abstracts

DOI: 10.1149/ma2023-02171184mtgabs

Authors: Joseph L. Powell, Ara Philipossian, Yasa Sampurno, Jason J. Keleher

Institution: Lewis University

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4391663133

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