Wafer printability simulation of EUV mask defects using mask SEM and AFM
Year: 2024
Type: conference-paper
DOI: 10.1117/12.3010196
Authors: Donghwan Son, Lanpo He, Masaki Satake, Ying He, Kihun Park, Suhwan Kim, Jing Jiao, Peter Hu, Vikram L. Tolani, Kangjoon Seo, Kiwoo Jun, Heeyeon Jang, Sujeong Won, Bonseung Koo, Yongwook Lee, Sungha Woo, Euisang Park
Institutions: KLA (United States), SK Hynix (South Korea)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4392092289