Work

Temperature Etching and Metallic Agent Concentration Effect on Structure, Morphology and Wettability of Silicon Nanowires

Year: 2024

Type: article

Source: Journal of nano research

DOI: 10.4028/p-f5zwhy

Authors: S. Lamrani, T. Hadjersi, S. Amirouche, N. Oussaf, M. Mebarki, R. Belhoucif

Institutions: University of Boumerdes, Centre de Recherche en Technologie des Semi-conducteurs pour l’Energétique, Centre de Recherche Scientifique et Technique en Analyses Physico-Chimiques

Language: English

Topic: Silicon Nanostructures and Photoluminescence

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4394579845

FWCI: 0.088

Cites: 44

Cited by: 1

Related to: 10