Work

Process Variation Impact on Dual Dielectric Gate-All-Around Tunnel FETs

Year: 2024

Type: conference-paper

Source: International Conference on Computer, Electrical & Communication Engineering (ICCECE)

DOI: 10.1109/iccece58645.2024.10497410

Authors: Pankaj Kumar, Ajay Chauhan, Samant Raj, Kalyan Koley, Poonam Raturi

Institutions: Graphic Era University, Birla Institute of Technology, Mesra

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4394911368

FWCI: 1.336

Cites: 7

Cited by: 2

Related to: 10