Work

Investigate on material removal of 3C-SiC crystals in nano-polishing via molecular dynamics

Year: 2024

Type: article

Source: Journal of Manufacturing Processes

DOI: 10.1016/j.jmapro.2024.04.080

Authors: Huan Liu, Pengyue Zhao, Dongxu Wu, Duo Li, Shunbo Wang, Xifeng Gao, Dawei Wang, Xin Wu, Shujun Huang, Jiubin Tan

Institutions: Harbin Institute of Technology, Shanghai Jiao Tong University, State Key Laboratory of Mechanical System and Vibration, Jilin University

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, China Postdoctoral Science Foundation, Natural Science Foundation of Heilongjiang Province, Heilongjiang Provincial Postdoctoral Science Foundation, Collaborative Innovation Center of Major Machine Manufacturing in Liaoning, China Academy of Space Technology, Postdoctoral Research Foundation of China

Awards: G1759495156, G2632236718, G3013198871, G3320241884, G3389680642, G3886678997, G4228622433

OpenAlex ID: W4396532769

FWCI: 5.124

Cites: 56

Cited by: 49

Related to: 10