Work

Rate Equation for TiN Etching in Dilute H2O2

Year: 2024

Type: conference-abstract

Source: ECS Meeting Abstracts

DOI: 10.1149/ma2024-02312284mtgabs

Authors: Dai Ueda, Akiko Harumoto

Institutions: SCREEN Semiconductor Solutions Co., Ltd. (Japan), SCREEN (Japan)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405589350

Cites:

Cited by: 1

Related to: 10