Work

A novel liquid film shearing polishing technique for silicon carbide and its processing damage mechanisms

Year: 2025

Type: article

Source: Applied Surface Science

DOI: 10.1016/j.apsusc.2025.162317

Authors: Hongyu Chen, Hongbing Wan, Binbin Hong, Wei Hang, Te Zhu, Peng Zhang, Xingzhong Cao, Qiu Xu, Rong Wang, Xuefeng Han, Binghai Lyu

Institutions: Zhejiang University of Technology, Chinese Academy of Sciences, Institute of High Energy Physics, Institute for Integrated Radiation and Nuclear Science, Kyoto University, Zhejiang University

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funders: National Natural Science Foundation of China, National Key Research and Development Program of China, Fundamental Research Funds for the Provincial Universities of Zhejiang

Awards: G1221038068, G736327503, G7700139431, G8614570936, G8755666370

OpenAlex ID: W4406127635

FWCI: 9.95

Cites: 65

Cited by: 32

Related to: 10