Work

Reduction of Specific Contact Resistivity by Employing Pre-Amorphization Implantation and In-Situ Steam Generation Oxidation

Year: 2024

Type: conference-paper

Source: IEEE International Conference on Solid-State and Integrated Circuit Technology

DOI: 10.1109/icsict62049.2024.10831274

Authors: Chang Liu, Xu Chen, Jinbiao Liu, Yanping He, Wenjuan Xiong, Weibing Liu, Mingshan Liu, Zhe Liu, Yaoqi Dong, Jeffrey Xu, Jing Xu, Jun Luo

Institutions: Chinese Academy of Sciences, Huawei Technologies (China)

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4406460892

FWCI:

Cites: 14

Cited by:

Related to: 10