Work

Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering

Year: 2024

Type: article

Abstract: An important issue in EUV resist is the development of low line width roughness (LWR) resists. One of the factors that worsen LWR is hypothesized to be the non-uniform distribution of functional groups within the resist. Therefore, it is required for the development of low LWR resist that the controlling of the spatial distribution of resist component materials on the nanometer scale.

Source: Journal of Photopolymer Science and Technology

DOI: 10.2494/photopolymer.37.591

Authors: Yuri Ebuchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Institution: University of Hyogo

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: diamond

OpenAlex ID: W4406789618

FWCI: 0.312

Cites: 18

Cited by: 3

Related to: 10