Work

Study on the etching mechanism of quartz using dual-frequency (60 MHz/400 KHz) capacitively coupled C4F8/Ar/O2 plasma

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004206

Authors: Chan Li, Liyue Gong, Ziyan Tan, Na Li, Yongxin Liu, Fei Gao, Xianxiu Mei

Institution: Dalian University of Technology

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G3847112414

OpenAlex ID: W4407686864

FWCI: 0.231

Cites: 38

Cited by: 1

Related to: 10