Work

Behavior of bipolar pulsed high-power impulse magnetron sputtering plasma studied using Langmuir probe

Year: 2025

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004188

Authors: Kam-Hong Chau, Yoshinobu Kawai, Jia-Lin Syu, Ying-Hung Chen, Chi-Wai Kan, Ju-Liang He

Institutions: Hong Kong Polytechnic University, Feng Chia University, Kyushu University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science and Technology Council

Award: Vhf-Ccp Plasma Etching Process for Abf Vi a Hole Forming Application( I )

OpenAlex ID: W4407774009

FWCI: 0.453

Cites: 30

Cited by: 2

Related to: 10