Work

Cerium contamination on silicon carbide optics during CMP: TOF-SIMS, XPS characterization, and ReaxFF MD simulation

Year: 2025

Type: article

Source: Applied Surface Science

DOI: 10.1016/j.apsusc.2025.163390

Authors: Yongjie Li, Longxiang Li, Hongda Wei, Xingchang Li, Yiren Wang, Shi Pan, Xuejun Zhang

Institutions: Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, University of Chinese Academy of Sciences

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4409854940

FWCI: 3.42

Cites: 37

Cited by: 11

Related to: 10