Work

The Critical Role of Passivation Layer and Semiconductor Interface on the Hydrogen Stability of ALD IGZO Transistors

Year: 2025

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/ted.2025.3575400

Authors: Zhiyu Lin, Lu Kang, Jinxiu Zhao, Chen Wang, Peiyan Hong, Kai Jiang, Shiheng Lu, Ziheng Wang, Heng Wang, Xiuyan Li, Xuefei Li, Ying Wu, Jeffrey Xu, Mengwei Si

Institutions: Shanghai Jiao Tong University, Huawei Technologies (China), Huazhong University of Science and Technology

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Shanghai Jiao Tong University

Awards: G234915527, G4039596302, G5369691468

OpenAlex ID: W4411203604

FWCI: 1.865

Cites: 33

Cited by: 9

Related to: 10