Work

Advanced CJ-NFe-FET architectures with ferroelectric gate stacks: Optimizing Electrostatics, linearity, and energy storage for next-generation nanoelectronics

Year: 2025

Type: article

Source: Micro and Nanostructures

DOI: 10.1016/j.micrna.2025.208386

Authors: Abhay Pratap Singh, Alok Kumar, Vibhuti Chauhan, R.K. Baghel

Institutions: Maulana Azad National Institute of Technology, Noida International University

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Affordable and clean energy

Open Access status: closed

OpenAlex ID: W4415218596

FWCI: 1.801

Cites: 51

Cited by: 8

Related to: 10