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Combining Inkjet Printing and Nanoimprint Lithography for Nanopatterning with Uniform Residual Layer Thickness

Year: 2025

Type: conference-paper

Source: CAS proceedings

DOI: 10.1109/cas66707.2025.11222351

Authors: P. Schuster, L. Vsetecka, J. Rimböck

Institution: EV Group (Austria)

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4415969765

FWCI: 9.355

Cites: 10

Cited by: 2

Related to: 10