Work

Chemical Vapor Deposition of Y2O3 Films Using Y(dpm)3

Year: 2002

Type: article

Source: Inorganic Materials

DOI: 10.1023/a:1015110023168

Authors: V. V. Bakovets, T. M. Levashova, V. T. Ratushnyak, L. F. Bakhturova

Institutions: Russian Academy of Sciences, Siberian Branch of the Russian Academy of Sciences, Nikolaev Institute of Inorganic Chemistry

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W53816518

FWCI: 0.688

Cites: 5

Cited by: 15

Related to: 10