Work

100 nm Electron Beam Lithography for GaAs Fet Devices : Microfabrication and Physics

Year: 1989

Type: article

Source: JJAP series

Authors: B. Wolfstädter, A. Colquhoun, Konrad Wegener

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W623963786

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