IP/Patent Pattern Layer
Year: 2026
Type: article
Abstract: Restricted-access technical specification (ruahAI, proprietary).This deposit contains a consolidated, single-file Edge-AI configuration blueprint with strict fail-closed safety, privacy-by-design, drift/rollback governance, and reproducible versioning.It additionally includes an IP/Patent Pattern Layer that flags candidate innovation patterns as hypotheses (no legal conclusions), producing redacted, auditable handover bundles for internal IP review and evidence-gap closure.Civil-use baseline; no person profiling/biometrics/targeting; no operational security guidance.
Author: Brueckner, Winfried
Language: English
Subfield: Artificial Intelligence
Field: Computer Science
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W7128949586
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