Work

SXR development for metrology, inspection, and process control using a discharge-produced plasma source

Year: 2026

Type: conference-paper

Source: Metrology, Inspection, and Process Control XXXVI

DOI: 10.1117/12.3091019

Authors: Henry Chou, Nanu Brates, David B. Reisman, Daniel Arcaro, Nick Lubinsky, Wolfram A. Neff, Michael Roderick, Aaron Feldman, Don McDaniel, Deborah Gustafson, Kosuke Saito

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7130722360

FWCI:

Cites:

Cited by:

Related to: 10