Work

Unveiling the mechanisms of surface removal and subsurface damage in nanocutting ion-implantation GaN via atomistic simulation

Year: 2026

Type: article

Source: Materials Science in Semiconductor Processing

DOI: 10.1016/j.mssp.2026.110611

Authors: Haowei Fu, Fengwei Yuan, Chenhao Wen, Yanqiang Lu, Hao Teng, Jian Guo

Institution: University of South China

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Natural Science Foundation of Hunan Province, University of South China

Awards: G7119985520, G7572281864

OpenAlex ID: W7140092072

FWCI: 2.221

Cites: 50

Cited by: 1

Related to: 10