Work

Multiscale coupled plasma–feature simulation for 3D profile evolution in Si etching under HBr/Cl2 mixture plasmas

Year: 2026

Type: article

Source: Physics of Plasmas

DOI: 10.1063/5.0333544

Authors: Yeong Geun Yook, Sang Young Chung, Hae Sung You, Jae Hyeong Park, Won Seok Chang, Deuk Chul Kwon, Dong Hun Yu, Byung Jun Lee, Kwang-Ho Kwon, Yeon Ho Im

Institutions: Korea Institute of Fusion Energy, Jeonbuk National University, Korea University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Research Council of Science and Technology

Award: G75951965

OpenAlex ID: W7201844216

FWCI:

Cites: 33

Cited by:

Related to: 10