Work

Enhanced thermal robustness of laminated Hf0.5Zr0.5O2 ferroelectric film via Al2O3 mid-layer engineering

Year: 2026

Type: article

Source: Applied Surface Science

DOI: 10.1016/j.apsusc.2026.168116

Authors: Seonggeun Kim, Seungwon Go, Jangsaeng Kim, Sihyun Kim, Sangwan Kim

Institution: Sogang University

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Affordable and clean energy

Open Access status: closed

Funders: Ministry of Education, Ministry of Trade, Industry and Energy, National Research Foundation of Korea, Ministry of Science and ICT, South Korea, Samsung

Awards: G2643336817, G3800596590, G4508828515, G5995805984, G6754764365, G6940113471

OpenAlex ID: W7202356972

FWCI:

Cites: 26

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Related to: 10