Work

Impact of O 2 plasma post-treatment on the chemical, morphological and wetting properties of SiO x thin films deposited by PECVD from HMDSO vapors

Year: 2026

Type: article

Source: Physica Scripta

DOI: 10.1088/1402-4896/ae9ad9

Authors: D Daoudi, S Sahli, M Kihel, A Bellel, P Raynaud

Institutions: University Frères Mentouri Constantine 1, Centre National de la Recherche Scientifique, Université Toulouse III - Paul Sabatier, Institut National Polytechnique de Toulouse, Laboratoire Plasma et Conversion d'Energie, Université de Toulouse

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7203597707

FWCI:

Cites: 31

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Related to: 10