Current status of atomic layer etching and its adoption to low-k fine patterning: An industrial perspective
Year: 2026
Type: article
DOI: 10.1116/6.0005592
Authors: Sanghyun Lee, HyunWook Ra, Keun Hee Bai
Institution: Samsung Electronics (South Korea)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W7204175672