Work

Structure–property relationships in molecular antimony photoresists for extreme ultraviolet lithography

Year: 2026

Type: article

Source: Chemical Engineering Journal

DOI: 10.1016/j.cej.2026.184113

Authors: Khuslen Bazarragchaa, Yubin Choi, Seoyeon Kim, Ji Hye Baek, Jinmo Kim, Cheolhong Park, Song-Se Yi, Cheolgyu Lee, Shufang Zhao, Huiyeong Ju, Chan-Cuk Hwang, Youngmin You

Institutions: Yonsei University, Samsung Electronics (South Korea), Pohang Accelerator Laboratory, Korea Basic Science Institute

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W7204194717

FWCI:

Cites: 71

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Related to: 10