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CNN surrogate model and dynamic blur exposure combined approach for edge jaggedness suppression in DMD maskless lithography

Year: 2026

Type: preprint

Source: SSRN Electronic Journal

DOI: 10.2139/ssrn.7355188

Authors: shengzhou huang, linsong zhu, chengcheng sheng, chenyi song, siwen he, yongkang shao, dongjie wu, jiani pan

Institution: Anhui Polytechnic University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W7204274723

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