Work

Optimizing Laser-Produced Plasma Sources for EUV and BEUV Lithography Using Multi-Fidelity Simulations

Year: 2026

Type: conference-paper

Abstract: The advancement of next-generation microelectronics relies on the development of efficient light sources for extreme ultraviolet (EUV) and beyond-EUV (BEUV) lithography [1]. This work details a computational investigation into optimizing the conversion efficiency (CE) of laserproduced plasma (LPP) sources using tin (Sn) for 13.5-nm EUV emission and gadolinium (Gd) for 6.7-nm BEUV emission. We utilize the 1D radiation-hydrodynamics code HELIOS-CR [2] to perform extensive parameter studies, varying laser intensities from$5 \times 10^{10}$to$1.5 \times 10^{12} \mathrm{W}/\text{cm}^{2}$and target thicknesses from 100 nm to 10 microns.

Source: IEEE International Conference on Plasma Science (ICOPS)

DOI: 10.1109/icops53334.2026.11660197

Authors: Towfiq Ahmed, Tyler Ray, Mathew Polek, Benjamin Kowash, Tirtha Joshi, Farhat N. Beg, Igor Golovkin, Sivanandan S. Harilal

Institutions: Pacific Northwest National Laboratory, University of California System, Prism Computational Sciences (United States)

Language: English

Topic: Laser-Plasma Interactions and Diagnostics

Subfield: Nuclear and High Energy Physics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: hybrid

OpenAlex ID: W7204601828

FWCI:

Cites: 4

Cited by:

Related to: 10