The dual impact of technostress on social networking services users' lurking intention: a post-adoption regret perspective
Year: 2026
Type: article
Study design: Observational Study
Source: Internet Research
Authors: Xiaodan Liu, Mengyao Zhao, Chao Su
Language: English
Subfield: Social Psychology
Field: Psychology
Domain: Social Sciences
Open Access status: closed
OpenAlex ID: W7204986969
