Work

Metrology for Ion Implantation Process Control

Year: 2026

Type: book-chapter

Source: Topics in applied physics

DOI: 10.1007/978-3-032-31173-3_6

Authors: Mathias Rommel, Nikolay Cherkashin, Volker Häublein, Robert Hillard, Peter Horvath, Wilfried Lerch, Chiao Yu Liu, Paula Peres, Katherine P. Rice, Tamás Sipőcz, Dénes Zoltán Ullrich

Institutions: Fraunhofer Institute for Integrated Systems and Device Technology, Centre National de la Recherche Scientifique, Centre d’Élaboration de Matériaux et d’Études Structurales, Université de Toulouse, Semilab (Hungary), Cameca (France), Cameca (United States)

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7207532112

FWCI:

Cites: 126

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Related to: 10