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From mask to wafer: verifying Corner Enhancement in the SLX3 DUV laser mask writer using AIMS

Year: 2026

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3117658

Authors: Martin Glimtoft, Alexandra Baum, Tine Libbrecht, Charles Björnberg, Balachander Chokkalingam, Adem Ergül, Robert Eklund, Xueying Hai, Charlie Shih, Chih-Chun Chang

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7208764607

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