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Atomically Precise Fluoroalkylation Engineering of Titanium-Oxo Clusters for Tailored Lithography Performance

Year: 2026

Type: article

Source: CCS Chemistry

DOI: 10.31635/ccschem.026.202608434

Authors: Zuohu Zhou, Dongao Mao, Zeqi Yu, Siming Qi, Ni Zhen, Lanjun Guo, Yanfeng Bi, Wolfgang Schmitt, Lei Zhang

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: diamond

OpenAlex ID: W7214361007

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