Study of the Substrate Effect on the Microstructural Properties of Zinc Oxide Thin Film
Year: 2024
Type: article
Abstract: Nanostructured zinc oxide (ZnO) thin films are synthesized on silicon as well as glass substrate using RF sputtering technique. The substrate temperature during deposition is varied from room temperature to 200 oC. The chamber pressure during deposition is kept constant at 20 x 10-3 torr. The scanning electron microscope (SEM) and atomic force microscopy (AFM) is used to study the influence of substrate on microstructural and morphological properties respectively. As the substrate temperature increases from room temperature to 200 oC the grain size on silicon substrate is increases from 35 to 57 nm while there is no signification variation is observed in grain size on glass substrate. The smoothness of surface is measured in terms of average roughness value using atomic force microscopy. The average roughness value of deposited ZnO thin film on silicon substrate varies from 2.88 nm to 2.53 nm while it varies from 2.09 nm to 2.39 nm on glass substrate as substrate temperature varies from room temperature to 200 oC. The minimum average roughness on silicon and glass is obtained at 100 oC and at room temperature respectively.
Source: Nanotechnology Perceptions
Authors: Shobi Bagga, Sanju Tanwar, Mayank Mewara
Language: English
Topic: ZnO doping and properties
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W7216710682