Work

Dynamic evolution and lifetime modeling of EUV CNT pellicles under hydrogen exposure

Year: 2026

Type: conference-abstract

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3118563

Authors: Chih-Yang Huang, Chien-Hua Wang, Yen-Jung Chen, Wen-Wei Wu, Kuo-Lun Tai, Chien-Min Lee, Shy-Jay Lin, C. W. Wen

Institutions: Taiwan Semiconductor Manufacturing Company (Taiwan), National Yang Ming Chiao Tung University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7224950264

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