Work

Rotation-angle-dependent stability and H-passivation-tuned electronic properties of monolayer MoS2/4H-SiC (0001)

Year: 2026

Type: article

Source: Applied Surface Science

DOI: 10.1016/j.apsusc.2026.168916

Authors: Qian Liu, Lihan Wang, Zebin Li, Caijuan Xia, Guoqing Zhang, Zetong Hu, Di Chen, Binbin Ding, Qinglong Fang, Lianbi Li

Institutions: Xi'an Polytechnic University, Xidian University

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7225628009

FWCI:

Cites: 35

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Related to: 10