Preparation of a-Si:H films and devices in the Interdigital-Vertical-Electrode Deposition Apparatus
Year: 1984
Type: article
Authors: Heisuke Sakai, T. Ichimura, M. Kamiyama, K. Maruyama, Yuta Uchida, T. Yoshida
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W80405108
