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Risch
Institution:
Infineon Technologies (Germany)
Observed institutions:
Siemens (Germany),
Infineon Technologies (Germany)
OpenAlex ID:
A5003085041
Perspectives of fully-depleted SOI transistors down to 20nm gate length
2002
·
Luyken
, Stadele
, et al.
·
IEEE International SOI Conference (SOI)
·
10
Impact ionization and band-to-band tunneling in ultrathin body SOI devices with undoped channels
2003
·
Luyken
, Hartwich
, et al.
·
5
Fabrication and Electrical Characterization of SI/SIGE P-Channel MOSFETs with a Delta Doped Boron Layer
1996
·
Risch
, �. Fischer
, et al.
·
European Solid-State Device Research Conference
·
3
A 60ns Hot Electron Resistant 4m dram with Trench Cell
1988
·
Harter
, Pribyl
, et al.
·
Digest of technical papers/Digest of technical papers - IEEE International Solid-State Circuits Conference
·
3
Channel Engineering using RP-CVD Epitaxy for High Performance CMOS Transistors
1996
·
Risch
, Schäfer
, et al.
·
European Solid-State Device Research Conference
·
1
High resolution 2D Scanning Spreading Resistance Microscopy (SSRM) of thin film SOI MOSFETs with ultra short effective channel length
2003
·
Hartwich
, Alvarez
, et al.
130nm Vertical PMOS Transistors with P+ Poly-Gate
1998
·
R. C. Schulz
, Rosner
, et al.
·
European Solid-State Device Research Conference
Low-Frequency Noise in SiGe P-Channel MOSFETs designed for 0.13 um Technology
1998
·
Okhonin
, Georgescu
, et al.
·
European Solid-State Device Research Conference
Vertical MOS Transistors with 70nm Channel Length
1995
·
Risch
, Krautschneider
, et al.
·
European Solid-State Device Research Conference
High Capacitance Isolated Surrounding Stacked Trench Cell For Advanced DRAMs
1991
·
Hofmann
, Hänsch
, et al.
·
European Solid-State Device Research Conference
Fully Scalable Gain Memory Cell for Future Drams
1991
·
Krautschneider
, Risch
, et al.
·
European Solid-State Device Research Conference
Dynamic Hot-Carrier Degradation of Fast-Switching CMOS Inverters with Different Duty Cycles
1988
·
Risch
, Weber
·
European Solid-State Device Research Conference
Submicron MOS process with 10:1 optical-projection printing and anisotropic dry etching
1983
·
Müller
, Beinvogl
, et al.
·
IEE Proceedings I Communications, Speech and Vision [see also IEE Proceedings-Communications]
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Works count:
13
Citation count:
22
H-index:
3
I10-index:
1
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