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Toshihiko Iwao

Observed names: Iwao, Toshihiko, T. Iwao
ORCID: 0000-0002-1672-6872
Observed ORCID: 0000-0002-1672-6872
OpenAlex ID: A5004400986
Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition
2017 · Toshihiko Iwao, Peter L. G. Ventzek, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 16
Theoretical evaluation of thermal decomposition of dichlorosilane for plasma-enhanced atomic layer deposition of silicon nitride: the important role of surface hydrogen
2018 · Gregory Hartmann, Peter L. G. Ventzek, et al. · Physical Chemistry Chemical Physics · 15
Atomic Precision Device Fabrication Using Cyclic Self-Limiting Plasma Processes: Involving Silicon, Silicon Nitride, and Silicon Dioxide
2019 · Peter L.G. Ventzek, Toshihiko Iwao, et al. · IEEE Nanotechnology Magazine · 7
Ammonium chloride (–NH3+Cl-) salt formation from dichlorosilane decomposition and its potential impact on silicon nitride atomic layer deposition
2023 · Tsung-Hsuan Yang, Erik S. Cheng, et al. · Applied Surface Science · 5
Microkinetic based growth and property modeling of plasma enhanced atomic layer deposition silicon nitride thin film
2023 · Toshihiko Iwao, Tsung-Hsuan Yang, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 5
Characterization of neutral species in an NH3-Ar plasma generated by a capacitively coupled plasma source at various radio frequencies
2023 · S. M. Johnson, J. P. Zhao, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 3
Plasma enhanced atomic layer deposition of silicon nitride and silicon carbonitride using a single source precursor and different plasmas
2025 · Samuel M. Johnson, Jianping Zhao, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1
Radial spatiotemporal evolution of rf magnetic field and plasma current in a very-high-frequency plasma source over a wide range of plasma density and pressure
2021 · Jianping Zhao, Peter L. G. Ventzek, et al. · Physical review. E · 1
Simulations of sheath-wave interactions controlling low frequency modulation of uniformity in VHF driven plasma sources
2019 · Toshihiko Iwao, Peter L. G. Ventzek, et al. · Bulletin of the American Physical Society
Diagnostics of plasma neutral species in a very high frequency oxygen plasma with high sensitivity broadband absorption spectroscopy
2018 · Zhao, J., Ventzek, Peter L G, et al. · HAL
Reaction Mechanisms of Halogenated Silanes on N-Rich Surfaces during Atomic Layer Deposition of Silicon Nitride
2018 · Gregory Peter Hartmann, Peter Ventzek, et al. · ECS Meeting Abstracts
Fluid Modeling of a Very High Frequency Capacitively Coupled Reactor
2016 · Rochan Upadhyay, Laxminarayan Raja, et al. · Bulletin of the American Physical Society
Reactive radical production and transport analysis in ammonia-hydrogen-argon microwave plasmas
2015 · Toshihiko Iwao, Peter L. G. Ventzek, et al. · Bulletin of the American Physical Society
Self-Consistent Simulations of the Radial Line Slot Antenna Plasma Source
2013 · Peter L. G. Ventzek, Rochan Upadhyay, et al. · Bulletin of the American Physical Society
Works count: 16
Citation count: 53
H-index: 5
I10-index: 2
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