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Rahul Jairath

Initial study on copper CMP slurry chemistries
1995 · Ronald Carpio, Janos Farkas, et al. · Thin Solid Films · 142
Selective and blanket copper chemical vapor deposition for ultra-large-scale integration
1993 · A. Jain, T. T. Kodas, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 94
Particulate generation in silane/ammonia rf discharges
1990 · Harold M. Anderson, Rahul Jairath, et al. · Journal of Applied Physics · 62
Effect of Polishing Pad Material Properties on Chemical Mechanical Polishing (Cmp) Processes
1994 · Rajeev Bajaj, Mukesh Desai, et al. · MRS Proceedings · 49
Consumables for the Chemical Mechanical Polishing (Cmp) of Dielectrics and Conductors
1994 · Rahul Jairath, Mukesh Desai, et al. · MRS Proceedings · 49
Polishing characteristics of different glass films
1993 · Robert Tolles, Hubert M. Bath, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Planarization Ability of Chemical Mechanical Planarization (Cmp) Processes
1994 · Matt Stell, Rahul Jairath, et al. · MRS Proceedings · 4
Chemical Mechanical Polishing for Planarization in Manufacturing Environment
1994 · Mukesh Desai, Rahul Jairath, et al. · MRS Proceedings · 3
Introduction
1994 · Rahul Jairath, Ajay Jain, et al. · 2
Slurry chemistry effects during chemical-mechanical polishing of silicon oxide films
1993 · Rahul Jairath, Hubert M. Bath, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Rapid Thermal Annealing of Titanium in an Ammonia Ambient: Kinetics and Film Properties
1991 · K. Srikrishna, R. Jairath, et al. · MRS Proceedings · 1
Key Issues and Advances in Cmp Technology for Inter-level Dielectrics
1997 · Rahul Jairath, Tom Mallon, et al. · 半導体・集積回路技術シンポジウム講演論文集
Process integration issues in chemical-vapor-deposited copper-based metallization
1993 · Ajay Jain, Toivo T. Kodas, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Application of Ftir Spectroscopy to the Characterization of as-Deposited and Chemical Mechanical Polished (CMP) Electron Cyclotron Resonance (ECR) Plasma Based SiO2 Films
1993 · Mukesh Desai, Ron Carpio, et al. · MRS Proceedings
Effects of Line Width, Thickness and Alloy Temperature on the Breakdown Energy of Thin Aluminum Lines
1992 · Rahul Jairath, Kamesh Gadepall, et al. · MRS Proceedings
Effects of Line Width, Thickness and Alloy Temperature on the Breakdown Energy of thin Aluminum Lines
1992 · Rahul Jairath, Katnesh Gadepallu, et al. · MRS Proceedings
Works count: 16
Citation count: 412
H-index: 5
I10-index: 5
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