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Author

Elvis Yang

Observed names: Elvis T. C. Yang, Yang Elvis
Observed institution: Macronix International (Taiwan)
ORCID: 0000-0001-6058-8326
Observed ORCID: 0000-0001-6058-8326
OpenAlex ID: A5011288614
Overlay target design and evaluation for SADP process
2012 · C. W. Yeh, Chao-Tien H. Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16
SRAF placement with generative adversarial network
2021 · Weilun Ciou, Tony Hu, et al. · SPIE Optical Microlithography · 9
Low-proximity contact hole formation by using double-exposure technology (DET)
2003 · Charles Chang, Elvis Yang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Machine learning OPC with generative adversarial networks
2022 · Weilun Ciou, Tony Hu, et al. · DTCO and Computational Patterning · 7
Within-wafer CD variation induced by wafer shape
2016 · Chi-hao Huang, Mars Yang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Novel ATHENA mark design to enhance alignment quality in double patterning with spacer process
2010 · L. W. Chen, Mars Yang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Rule-based hotspot correction using a pattern matching flow
2021 · Bradley J. Falch, Tony Hu, et al. · SPIE Design-Process-Technology Co-optimization · 5
Exposure process optimization using machine learning overlay prediction
2022 · Masahiro Yoshida, Wei-Hung Wang, et al. · Metrology, Inspection, and Process Control XXXVI · 4
Machine learning modeling using process context and exposure data for overlay prediction
2022 · Wei-Hung Wang, Irina Brinster, et al. · Metrology, Inspection, and Process Control XXXVI · 4
Overlay degradation induced by film stress
2017 · Chi-hao Huang, Yu-Lin Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
SMO and NTD for robust single exposure solution on contact patterning for 40nm node flash memory devices
2013 · Chih-Chieh Yu, C. C. Yang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Overlay control improvements through dynamic sampling
2024 · Onur N. Demirer, Robin M. Zech, et al. · Metrology, Inspection, and Process Control XXXVI · 3
Advanced regression OPC model setup
2024 · Yu-Tang Hu, Weilun Chiu, et al. · DTCO and Computational Patterning · 3
Machine learning optical proximity correction with generative adversarial networks
2022 · Weilun Ciou, Tony Hu, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 3
Sub-resolution assist feature placement with generative adversarial network
2021 · Weilun Ciou, Tony Hu, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 3
Imaging-based overlay metrology optimized by HV-SEM in 3D-NAND process
2021 · Yu-Lin Liu, Li-Ting Chang, et al. · Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV · 3
Optimizing the lithography model calibration algorithms for NTD process
2016 · C. M. Hu, Fred Lo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Investigation of device overlay variation and control metrology in 3D-NAND process
2023 · Yu-Lin Liu, Li-Ting Chang, et al. · Metrology, Inspection, and Process Control XXXVI · 2
CD uniformity control for thick resist process
2017 · Chi-hao Huang, Yu-Lin Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Pattern collapse solution for asymmetric pattern
2017 · C. J. Tu, C. H. Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
CD uniformity improvement of dense contact array in negative tone development process
2015 · Fengnien Tsai, Teng-hao Yeh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
A comprehensive comparison between double patterning and double patterning with spacer on sub-50nm product implementation
2008 · C. F. Tseng, C. C. Yang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Shape-induced overlay for wafer-to-wafer hybrid bonding
2025 · Yun-Hsuan Liu, Shao-Ju Chang, et al. · Metrology, Inspection, and Process Control XXXVI · 1
OPC model calibration using deep reinforcement learning
2025 · Weilun Chiu, Tony Hu, et al. · DTCO and Computational Patterning · 1
Lithography hotspot correction on post-OPC layout using generative adversarial networks
2023 · Weilun Ciou, Tony Hu, et al. · DTCO and Computational Patterning · 1
Works count: 51
Citation count: 114
H-index: 6
I10-index: 1
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