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Author

Dai Ueda

ORCID: 0000-0002-3615-5034
Observed ORCID: 0000-0002-3615-5034
OpenAlex ID: A5011775407
Effect of Hydrophobicity and Surface Potential of Silicon on SiO2 Etching in Nanometer-Sized Narrow Spaces
2021 · Dai Ueda, Yousuke Hanawa, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 12
Rate Equation for TiN Etching in Dilute H2O2
2024 · Dai Ueda, Akiko Harumoto · ECS Transactions · 2
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Scalable Particle Removal for sub-5 nm Nodes
2021 · Yukifumi Yoshida, Katsuya Akiyama, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 2
Quantifying reduced negative ion contributions in nano-confined SiO2 wet etching via reaction-pathway analysis
2026 · Dai Ueda, Akiko Harumoto · Micro and Nano Engineering · 1
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Vt Fine-Tuning for Multi-Vt using Wet Fine-Etching of LaO in Dipole-first
2025 · Hikaru Kawarazaki, Ju-Geng Lai, et al. · International Conference on Solid State Devices and Materials (SSDM) · 1
Rate Equation for TiN Etching in Dilute H2O2
2024 · Dai Ueda, Akiko Harumoto · ECS Meeting Abstracts · 1
Deuterium Isotopic Effect on Nanometer-Sized Narrow Spaces Formed by Silicon Walls
2024 · Shohei Miyagawa, Masayuki Otsuji, et al. · ECS Transactions · 1
Unique pH Effects on TiN Etching in Nano Confinement with Dilute H2O2 Solutions
2026 · Dai Ueda, Akiko Harumoto · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
Wet Process Development for Novel n-Type Dipole Materials ZrOx and YOx
2026 · Dai Ueda, Ju Geng Lai, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
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Enhancing SiOx Protection during SiGe Selective Wet Etch in CFET Integration Using Oxide Surface Functionalization
2026 · Farid Sebaai, Kazuki Yoshiura, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
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Electrolyte-Induced Recovery of SiO 2 Wet Etching in Nano-Confined Structures: Implications for Anionic Species Exclusion
2026 · Dai Ueda, Akiko Harumoto, et al. · ECS Journal of Solid State Science and Technology
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Precise Inner Spacer Etch-Back By Combining Ozone Gas Bake and Wet Chemical Etching
2024 · Hikaru Kawarazaki, Dai Ueda, et al. · ECS Meeting Abstracts
Deuterium Isotopic Effect on Nanometer-Sized Narrow Spaces Formed by Silicon Walls
2024 · Shohei Miyagawa, Masayuki Otsuji, et al. · ECS Meeting Abstracts
Works count: 13
Citation count: 20
H-index: 2
I10-index: 1
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