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Dietmar Ganz

Observed names: D. GANZ, D. Ganz, Ganz, Dietmar
OpenAlex ID: A5012111778
Sol-Gel Deposited Sb-Doped Tin Oxide Films
1998 · M. Guglielmi, E. Menegazzo, et al. · Journal of Sol-Gel Science and Technology · 24
Laser firing of transparent conducting SnO2 sol—gel coatings
1997 · D. Ganz, A. Reich, et al. · Journal of Non-Crystalline Solids · 13
Laser Sintering of SnO2 : Sb Sol-Gel Coatings
1998 · D. Ganz, G. Gasparro, et al. · Journal of Sol-Gel Science and Technology · 11
Untitled
1997 · D. GANZ, G. GASPARRO, et al. · Journal of Materials Science Letters · 10
Current state of 300-mm lithography in a pilot line environment
1999 · Alain B. Charles, John G. Maltabes, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Fast CO2 laser firing of sol-gel SnO2:Sb coatings
1997 · D. Ganz, G. Gasparro, et al. · Journal of Materials Science Letters · 5
Performance of 300-mm lithography tools in a pilot production line
1999 · John G. Maltabes, Alain B. Charles, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Multilayer SnO2:Sb transparent electronic conducting coatings made by the sol-gel process
1998 · Gasparro, Guido, Ganz, Dietmar, et al. · Publications of the UdS (Saarland University) · 2
SnO 2 :Sb transparent conducting coatings made by different sol-gel processes
1997 · G. Gasparro, Dietmar Ganz, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Lithography in a 300 mm pilot production line
2003 · D. Ganz, A. Charles, et al. · IEEE International Symposium on Semiconductor Manufacturing conference proceedings · 1
Influence of RTP flash anneal ramp rates on lithography overlay performance on 300 mm integrated wafers
2002 · O. Storbeck, D. Ganz, et al. · International Conference on Ion Implantation Technology · 1
Sub 0.2 μm lithography on 300 mm wafer
2002 · D. Ganz, A. Charles, et al. · IEEE International Symposium on Semiconductor Manufacturing conference proceedings
Is lithography ready for 300 mm?
2000 · Alain B. Charles, Clint Haris, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Effect of nonlinear errors on 300-mm wafer overlay performance
2000 · Sebastian Schmidt, Alain B. Charles, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Process performance comparisons on 300-mm i-line steppers, DUV stepper, and DUV scanners
2000 · Thorsten Schedel, Alain B. Charles, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 15
Citation count: 76
H-index: 5
I10-index: 4
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