Work

Is lithography ready for 300 mm?

Year: 2000

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.395736

Authors: Alain B. Charles, Clint Haris, Steffen R. Hornig, Dietmar Ganz, Thorsten Schedel, Guenther Hraschan, Wolfram Koestler, John G. Maltabes, Karl E. Mautz, Sebastian Schmidt, Ralf Schuster

Institution: Semiconductor Research Corporation

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2011057915

FWCI:

Cites:

Cited by:

Related to: 10