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Steffen R. Hornig
Observed names:
S. Hornig,
S.R. Hornig,
Steffen Hornig
Observed institution:
Infineon Technologies (Germany)
OpenAlex ID:
A5035677161
Effect and procedures of post-exposure bake temperature optimization on the CD uniformity in a mass production environment
2007
·
Kirsten Ruck
, Heiko Weichert
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
8
Current state of 300-mm lithography in a pilot line environment
1999
·
Alain B. Charles
, John G. Maltabes
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
CDU improvement with wafer warpage control oven for high-volume manufacturing
2009
·
T. Tomita
, H. Weichert
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Selected implications of photoresist processing in 300mm manfacturing
2002
·
Kay Lederer
, Steffen R. Hornig
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Performance of 300-mm lithography tools in a pilot production line
1999
·
John G. Maltabes
, Alain B. Charles
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Lithography in a 300 mm pilot production line
2003
·
D. Ganz
, A. Charles
, et al.
·
IEEE International Symposium on Semiconductor Manufacturing conference proceedings
·
1
Application of integrated scatterometry measurements for a wafer-level litho feedback loop in a high-volume 300 mm DRAM production environment
2006
·
Uwe Kramer
, Goeran Fleischer
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Sub 0.2 μm lithography on 300 mm wafer
2002
·
D. Ganz
, A. Charles
, et al.
·
IEEE International Symposium on Semiconductor Manufacturing conference proceedings
Is lithography ready for 300 mm?
2000
·
Alain B. Charles
, Clint Haris
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Effect of nonlinear errors on 300-mm wafer overlay performance
2000
·
Sebastian Schmidt
, Alain B. Charles
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Process performance comparisons on 300-mm i-line steppers, DUV stepper, and DUV scanners
2000
·
Thorsten Schedel
, Alain B. Charles
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
11
Citation count:
20
H-index:
2
I10-index:
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