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Youngseok Lee
Observed names:
Y S Lee,
Y. Lee,
Young-Seok Lee,
Young-seok Lee,
YoungSeok Lee,
이영석
show all 6
Institution:
Tokyo Electron (Japan)
Observed institutions:
Tokyo Electron (Japan),
Chungnam National University,
Korea Institute of Machinery & Materials,
Samsung Electronics (South Korea),
Korea Hydro and Nuclear Power Central Research Institute,
Pusan National University,
Sungkyunkwan University
show all 7
ORCID:
0000-0003-0900-166X
Observed ORCID:
0000-0003-0900-166X
OpenAlex ID:
A5012676193
Recombination control in high-performance quantum dot-sensitized solar cells with a novel TiO 2 /ZnS/CdS/ZnS heterostructure
2016
·
Young-Seok Lee
, Chandu V. V. M. Gopi
, et al.
·
Dalton Transactions
·
45
Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas
2021
·
Chulhee Cho
, Kwangho You
, et al.
·
Materials
·
40
PDF
RF magnetron sputtered indium tin oxide films with high transmittance and work function for a-Si:H/c-Si heterojunction solar cells
2013
·
Shahzada Qamar Hussain
, Woong-Kyo Oh
, et al.
·
Vacuum
·
40
Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching
2023
·
Hee-Jung Yeom
, Min Young Yoon
, et al.
·
ACS Omega
·
21
PDF
Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma
2022
·
Inho Seong
, Jinho Lee
, et al.
·
Nanomaterials
·
21
PDF
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled
2023
·
Wonnyoung Jeong
, Sijun Kim
, et al.
·
Materials
·
20
PDF
Crossing Frequency Method Applicable to Intermediate Pressure Plasma Diagnostics Using the Cutoff Probe
2022
·
Si-jun Kim
, Jang-jae Lee
, et al.
·
Sensors
·
18
PDF
Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction
2023
·
Minsu Choi
, Youngseok Lee
, et al.
·
Materials
·
17
PDF
Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe
2022
·
Youngseok Lee
, Heejung Yeom
, et al.
·
Nanomaterials
·
16
PDF
Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma
2022
·
Ye-Bin You
, Young-Seok Lee
, et al.
·
Nanomaterials
·
16
PDF
Purgeless atomic layer etching of SiO2
2022
·
Y S Lee
, S J Kim
, et al.
·
Journal of Physics D Applied Physics
·
14
PDF
A Quantification Method in Quadrupole Mass Spectrometer Measurement
2021
·
Youngseok Lee
, Sanghyeop Oh
, et al.
·
Applied Science and Convergence Technology
·
14
PDF
Study of Low Resistivity and High Work Function ITO Films Prepared by Oxygen Flow Rates and N2O Plasma Treatment for Amorphous/Crystalline Silicon Heterojunction Solar Cells
2014
·
Shahzada Qamar Hussain
, Woong-Kyo Oh
, et al.
·
Journal of Nanoscience and Nanotechnology
·
13
Development of the Measurement of Lateral Electron Density (MOLE) Probe Applicable to Low-Pressure Plasma Diagnostics
2022
·
Si-jun Kim
, Sang-ho Lee
, et al.
·
Sensors
·
11
PDF
A method to minimise the fading effects of LiF:Mg,Ti (TLD-600 and TLD-700) using a pre-heat technique
2014
·
Y. Lee
, Y. Won
, et al.
·
Radiation Protection Dosimetry
·
11
A 16-Gb 37-Gb/s GDDR7 DRAM With PAM3-Optimized TRX Equalization and ZQ Calibration
2024
·
Sung-Yong Cho
, Moon-Chul Choi
, et al.
·
IEEE Journal of Solid-State Circuits
·
10
Oxygen Vacancy Generation and Stabilization in Layered NiFeCo Double Hydroxide Nanosheets for a Highly Efficient Oxygen Evolution Reaction
2024
·
Birhanu Bayissa Gicha
, Lemma Teshome Tufa
, et al.
·
ACS Applied Nano Materials
·
10
Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2
2021
·
Youngseok Lee
, Inho Seong
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
10
Investigation into SiO2 Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled
2022
·
Won-nyoung Jeong
, Young-seok Lee
, et al.
·
Nanomaterials
·
9
PDF
Development of a High-Linearity Voltage and Current Probe with a Floating Toroidal Coil: Principle, Demonstration, Design Optimization, and Evaluation
2022
·
Si-jun Kim
, In-ho Seong
, et al.
·
Sensors
·
9
PDF
Plasma atomic layer etching of SiO2 with a low global warming potential fluorocarbon precursor (C6F6)
2024
·
Inho Seong
, Yebin You
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
8
Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2
2022
·
Youngseok Lee
, Sijun Kim
, et al.
·
Sensors
·
8
PDF
30.3 A 24Gb 42.5Gb/s GDDR7 DRAM with Low-Power WCK Distribution, an RC-Optimized Dual-Emphasis TX, and Voltage/Time-Margin-Enhanced Power Reduction
2025
·
Sang-Hoon Kim
, Jaehyeok Baek
, et al.
·
Digest of technical papers/Digest of technical papers - IEEE International Solid-State Circuits Conference
·
7
Determination of Plasma Potential Using an Emissive Probe with Floating Potential Method
2023
·
Chulhee Cho
, Sijun Kim
, et al.
·
Materials
·
7
PDF
Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath
2022
·
Inho Seong
, Sijun Kim
, et al.
·
Sensors
·
7
PDF
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Works count:
41
Citation count:
439
H-index:
13
I10-index:
18
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